NITTA HAAS INCORPORATED

Company Description

1969: Rodel Inc. founded in Newark, Delaware, USA
1983: Nitta Corporation and Rodel Inc. (currently the Dow Chemical Company) found Rodel Nitta Corporation (our company) as a joint venture
1984: Imports and sales of slurry produced by Nalco Company (via Rodel Inc.) and the SUBA series produced by Rodel Inc. begin, TA (Template Assembly) production begins
1988: With the introduction of new technology, production of the SUBA series of polishing cloths begins
1989: Utilizing our company's technology, production of the MH series of polishing cloths begins, provision of polishing systems to the Rodel Inc. chemical mechanical polishing (CMP) division begins
1992: Utilizing our company's technology, production of the R300 series of mounting film begins
1993: Provision of polishing systems to domestic device manufacturers begins
1995: Rodel Inc. obtains ISO 9001 certification; with the introduction of new technology, construction of a slurry production factory (mainly CMP slurry) in Mie Prefecture is approved
1996: Mie factory completed, Nara factory expanded
1997: Domestic production of CMP slurry begins at Mie factory, ISO 9001 certification obtained
1998: Mie factory expanded (second stage), production of IC1000 CMP pad series begins
1999: Mie factory expanded (third stage)
2000: Rodel Particle Inc. founded
2001: ISO 14001 certification obtained
2003: 20th anniversary of founding, clearing of the planned site of the Kyoto factory completed
2004: Rodel Inc. acquired in a merger, parent company becomes the Rohm and Haas Company, company name changed to Nitta Haas Incorporated, SAP system introduced
2005: Kyoto factory completed, Mie factory expanded (fourth stage)
2006: Relocation from Nara factory to Kyoto factory, Kyoto Technical Center established
2009: Rohm and Haas Company acquired in a merger, parent company becomes the Dow Chemical Company
2013: 30th anniversary of founding
Note: SUBA, MH, and IC1000 are products trademarked by our company.